Method and apparatus for analyzing sample

专利名称：Method and apparatus for analyzing sample发明人：大村 朋彦,富松 宏太,小林 憲司,西山 佳孝申请号：JP2017242937申请日：20171219公开号：JP2019110053A公开日：20190704

专利附图：

摘要：Problem to be solved: to provide a sample analysis method capable ofanalyzing the surface of a sample at high resolution and time by using an electron beamapparatus while introducing hydrogen into the sample. Solution: a sample table 10A forplacing the sample 11 and a sample chamber 10 provided with the detector 14An

electron gun chamber 30 provided with an electron gun 31 for irradiating electron beamsis provided.Electron beams are incident on the surface 11a of the sampleThe electronemitted from the surface 11a and one or more selected from the X-rayA method ofanalyzing a sample using an electron beam apparatus 100 detected by a detector14;Inside the sample chamberWith the surface 11a exposed to the hydrogen containingatmosphereHeating the surfaceInside the sample chamberUnder high vacuumThe step ofinjecting electron beams onto the surfaceIncludeSample analysis method.Diagram

申请人：日本製鉄株式会社

地址：東京都千代田区丸の内二丁目６番１号

国籍：JP

代理人：特許業務法人ブライタス

更多信息请下载全文后查看