Electron gun arrangement for use in the electron b

专利名称：Electron gun arrangement for use in the

electron beam evaporation process

发明人：Yamamoto, Hisashi申请号：EP90114411.3申请日：19900727公开号：EP0411482A2公开日：19910206

专利附图：

摘要：An electron gun arragement for use in an electron beam evaporation processincludes a permanent circuit (21-24) for deflecting the electron beam from its supplysource toward its crucible (41-44) and an electromagnetic coil winding means (161-164;

181-184) for sweeping the electron beam from one point to another particular point onthe substance to be evaporated. The electromagnetic coil winding means is disposed tosurround the permanent magnet circuit.

申请人：ANELVA CORPORATION

地址：8-1 Yotsuya 5-chome Fuchu-shi Tokyo 183 JP

国籍：JP

代理机构：Freiherr von Schorlemer, Reinfried

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