Pattern drawing device

专利名称：Pattern drawing device发明人：鈴木 智也,加藤 正紀,小宮山 弘樹申请号：JP2020116977申请日：20200707公开号：JP2020194167A公开日：20201203

专利附图：

摘要：PROBLEM TO BE SOLVED: To provide a pattern drawing device for drawing apredetermined pattern by scanning a spot light of a beam irradiated on an irradiatedsurface. A pattern drawing device includes an incident optical member M10 that receivesa beam from a light source device, a scanning deflection member PM that receives a

beam from the incident optical member and deflects the beam for one-dimensionalscanning. The beam scanning unit MD that integrally supports the telecentric projectionoptical system FT that projects perpendicularly to the irradiation surface, and the beamfrom the light source device that is attached to the main body of the device are switchedby the acousto-optic modulator AOM. When the light introduction optical system BDUleading to the incident optical member of the beam scanning unit and the normal line ofthe irradiated surface passing through the midpoint on the scanning line of a

predetermined length formed on the irradiated surface are defined as the irradiationcentral axis, the incident optics A coupling member that rotatably couples the beamscanning unit to the apparatus main body around the irradiation center axis so that theincident axis of the beam from the light introduction optical system incident on themember and the irradiation center axis are coaxial is provided. .. [Selection diagram] Fig. 5

申请人：株式会社ニコン

地址：東京都港区港南二丁目１５番３号

国籍：JP

代理人：千葉 剛宏,宮寺 利幸,千馬 隆之,仲宗根 康晴,坂井 志郎,関口 亨祐

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