专利名称：METHODS AND SYSTEMS FOR
CONTROLLING A SEMICONDUCTORFABRICATION PROCESS
发明人：Patrick D. Pannese,Vinaya Kavathekar,Peter
van der Meulen
申请号：US11877153申请日：20071023
公开号：US20080134075A1公开日：20080605
专利附图：
摘要：Software for controlling processes in a heterogeneous semiconductor
manufacturing environment may include a wafer-centric database, a real-time schedulerusing a neural network, and a graphical user interface displaying simulated operation ofthe system. These features may be employed alone or in combination to offer improvedusability and computational efficiency for real time control and monitoring of a
semiconductor manufacturing process. More generally, these techniques may be usefullyemployed in a variety of real time control systems, particularly systems requiringcomplex scheduling decisions or heterogeneous systems constructed of hardware fromnumerous independent vendors.
申请人：Patrick D. Pannese,Vinaya Kavathekar,Peter van der Meulen
地址：Lynnfield MA US,Cupertino CA US,Newburyport MA US
国籍：US,US,US
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