专利名称：Method of adjusting characteristics of
electron source, method of manufacturingelectron emission device
发明人：Makoto Kanda,Takahiro Oguchi,Akihiko
Yamano
申请号：US10067796申请日：20020208
公开号：US20020122018A1公开日：20020905
专利附图：
摘要：The present application discloses a characteristic adjusting method of executing
a step of changing the characteristics of display devices in an image display apparatus. Inparticular, the present invention discloses a configuration in which target values forchanges in characteristics are obtained by reducing the high-frequency components ofthe spatial distribution of the characteristics of the display devices.
申请人：KANDA MAKOTO,OGUCHI TAKAHIRO,YAMANO AKIHIKO
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