专利名称：SPUTTERING TARGET
发明人：Kazuaki Ebata,Shigekazu Tomai,Shigeo
Matsuzaki,Yuki Tsuruma
申请号：US14343031申请日：20120906
公开号：US20140252354A1公开日：20140911
专利附图：
摘要：A sputtering target including a sintered body:
申请人：Kazuaki Ebata,Shigekazu Tomai,Shigeo Matsuzaki,Yuki Tsuruma
地址：Sodegaura-shi JP,Sodegaura-shi JP,Sodegaura-shi JP,Sodegaura-shi JP
国籍：JP,JP,JP,JP
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