专利名称：Overlay Targets with Orthogonal
Underlayer Dummyfill
发明人：Nuriel Amir,Guy Cohen,Vladimir
Levinski,Michael Adel
申请号：US13898828申请日：20130521
公开号：US20130293890A1公开日：20131107
专利附图：
摘要：The disclosure is directed to designing and using an overlay target withorthogonal underlayer dummyfill. According to various embodiments, an overlay target
may include one or more segmented overlay pattern elements forming at least oneoverlay target structure. The overlay target may further include one or more inactivepattern elements forming at least one dummyfill target structure. Each of the one ormore inactive pattern elements may include dummyfill segmented along an axis
orthogonal to a segmentation axis of at least one proximately disposed overlay patternelement. In some embodiments, each of the target structures or layers may be formedfrom a separate process layer successively disposed upon a substrate, such as a siliconwafer. In some embodiments, the overlay and dummyfill target structures may betwofold or fourfold rotationally symmetric to allow for certain manufacturing ormetrology advantages.
申请人：KLA-Tencor Corporation
地址：Milpitas CA US
国籍：US
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