专利名称：Method of manufacturing multilayer film发明人：Yuichi Ohsawa,Shigeki Takahashi,Junichi
Ito,Daisuke Saida,Kyoichi Suguro,HiroakiYoda
申请号：US13226960申请日：20110907公开号：US09082961B2公开日：20150714
专利附图：
摘要：According to one embodiment, a method of manufacturing a multilayer film, themethod includes forming a first layer, forming a second layer on the first layer, and
transcribing a crystal information of one of the first and second layers to the other oneof the first and second layers by executing a GCIB-irradiation to the second layer.
申请人：Yuichi Ohsawa,Shigeki Takahashi,Junichi Ito,Daisuke Saida,KyoichiSuguro,Hiroaki Yoda
地址：Yokohama JP,Yokohama JP,Yokohama JP,Fuchu JP,Yokohama JP,Sagamihara JP
国籍：JP,JP,JP,JP,JP,JP
代理机构：Oblon, McClelland, Maier & Neustadt, L.L.P.
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