VITREOUS SILICA CRUCIBLE AND EVALUATION METHOD OF

专利名称：VITREOUS SILICA CRUCIBLE AND

EVALUATION METHOD OF THE SAME

发明人：Toshiaki SUDO,Tadahiro SATO,Ken

KITAHARA,Eriko KITAHARA

申请号：US15783969申请日：20171013

公开号：US20180045639A1公开日：20180215

专利附图：

摘要：A vitreous silica crucible used to pull up silicon single crystal includes: acylindrical straight body portion, a corner portion formed at a lower end of the straight

body portion, and a bottom portion connected with the straight body portion via thecorner portion, wherein the vitreous silica crucible further comprises: an opaque outerlayer enclosing bubbles therein; and a transparent inner layer from which bubbles areremoved, wherein the residual distortion's distribution obtained by measuring the silicaglass's inner surface in a non-destructed state has an optical path difference which is 130nm or less, which residual distortion's distribution is measured using a distortion-measuring apparatus which converts a linearly polarized light into circularly polarizedlight and then irradiates the crucible's wall.

申请人：SUMCO CORPORATION

地址：Tokyo JP

国籍：JP

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