专利名称：Capacitors integrated with inductive
components
发明人：John C. Tung,Minghao (Mary) Zhang申请号：US10894521申请日：20040719公开号：US07203923B2公开日：20070410
专利附图：
摘要：Techniques for producing integrated capacitors are disclosed. According to oneof the techniques, one or more layers are introduced in conjunction with a ground layersupporting a substrate on which various components are realized. Depending on the use
of an integrated capacitor, micro capacitors can be formed between one introduced layerand the ground layer or between two introduced layers. As all micro capacitors areconnected in parallel, an integrated capacitor with usable capacitance is thus producedwithout occupying an extra space that would otherwise increase the size of the siliconchip. In addition, with proper connections, an interdigitated capacitor can be formed aswell.
申请人：John C. Tung,Minghao (Mary) Zhang
地址：20975 Valley Green Dr., Suite 293 Cupertino CA 95014 US,20975 Valley GreenDr., Suite 293 Cupertino CA 95014 US
国籍：US,US
代理人：Joe Zheng
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